Ushio America UV-LED Light Source Units for Contact / Proximity Exposure
Mask aligner, light source for MEMS exposure
Features & Benefits
- The worldÕs first capability to simultaneously and uniformly irradiate multiple wavelengths on the same area.
- Materializes high quality parallel light within 3 degree viewing angle and available for contact and proximity exposure methods.
- Capable of complex programmed irradiation at each wavelength while supporting a variety of general-purpose resists.
Ð Independent output regulation and exposure timing control at i-, h-, and g-line wavelengths
Ð Bandpass filters and ND filters not required_
Ð 750 W lamp equivalent irradiance_
Ð Absence of heat means low irradiation temperature_
Ð Long life minimizes downtime
Ð Shutterless
